Correlative Workflow to Identify the Root Cause of Particle Contamination


Date: Wednesday, May 18, 2022
Time: 02:00 PM Eastern Daylight Time
Duration: 1 hour

Suppliers, manufacturers and end users demand ever-increasing quality standards, so an advanced technical cleanliness program is fundamental to eradicating critical particulate contamination along the entire production process. Understand how technical cleanliness solutions can identify the root cause of contamination, allowing you to make the right decision faster. The presentation will also include a Q&A session. You’ll walk away understanding how to do…

  1. Faster standard analyses: Detect metallic and non-metallic particles with only one filter scan
  2. Faster particle classification: Combine light and electron microscopy in a seamless workflow.
  3. Faster decision making: Analyze the chemical composition of killer particles to identify the contamination root cause.
  4. Faster reporting: Create cleanliness reports compliant with all established industry standards in one go.

Register Now!

Trevor Campbell
Industrial Microscopy Product Manager
ZEISS Industrial Quality Solutions

Trevor Campbell is the Industrial Microscopy Product Manager at ZEISS Industrial Quality Solutions, where he leads the light and electron microscopy business for the North American market.
Powered by on24

Register Now